Benano Unveils the Latest 3D Vertical Optical Technology at Automation Taipei in August
Exhibitor: BENANO INC.
Date: 2025-08-18
Booth No.: L802
Benano, Taiwan’s leading company specializing in measurement-grade structured light technology, will make a grand appearance at the 2025 Automation Taipei, held at the Taipei Nangang Exhibition Center, Hall 1, 4th Floor, in August. Benano will introduce its flagship product, the “Adaptive Depth Microscopy (ADM),” showcasing the latest advancements in 3D vertical optical inspection technology.
The ADM series represents a significant breakthrough for Benano in optical measurement technology. Designed specifically for inline full-inspection needs, it integrates high-speed scanning, large field-of-view imaging, and adaptive algorithms, optimized for four critical applications in the semiconductor and precision optics industries: Micro Bump, Micro LED, Micro Lens, and high-aspect-ratio blind via structures.
For Micro Bump applications, the ADM maintains high resolution while offering a wider field of view and faster imaging speeds, significantly reducing 3D inspection time for 12-inch wafers and boosting production line efficiency.
Addressing the challenges of Micro LED inspection, the ADM delivers superior imaging capabilities for composite materials, swiftly and accurately capturing the 3D profile and surface quality of each chip, ensuring high-yield manufacturing processes.
In the realm of Micro Lens, the ADM optimizes imaging angles to fully rebuild the surface curvature and intricate details of micro lenses, enabling efficient and precise high-speed topography fitting and optical property analysis.
When inspecting high-aspect-ratio blind via structures, the ADM demonstrates exceptional illumination imaging that pierces into the depths, effectively observing features such as pins and connector sockets that are challenging for conventional solutions, providing innovative solutions for process yield control in micro-connection components.
Benano emphasizes that the ADM series is built on three core design principles: “Quality First, High Adaptability, and Inline Full Inspection.” It overcomes the limitations of traditional sampling inspections constrained by speed, enabling true high-quality, comprehensive inspection control.
In addition to the ADM product, Benano will showcase various structured light measurement modules and application results at the exhibition. Benano sincerely invites industry professionals to visit and experience Benano’s innovative vision in the microscopic world.
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